首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch-neutralen Linie
摘要
申请公布号
DE69737311(T2)
申请公布日期
2007.06.28
申请号
DE19976037311T
申请日期
1997.02.06
申请人
ULVAC INC.
发明人
UCHIDA, TAIJIRO
分类号
H05H1/46;H01J37/32
主分类号
H05H1/46
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Process for producing a through-silicon via and a through-silicon capacitor in a substrate, and corresponding device
Metal shielding layer in backside illumination image sensor chips and methods for forming the same
Imaging apparatus using control electrode to perform focal point detection with phase difference detection type
Method for driving photoelectric conversion apparatus
Semiconductor device
Methods of forming semiconductor die assemblies
Package of environmental sensitive element
Wiring board and method of manufacturing wiring board
Semiconductor device and method for producing the same
Methods of removing gate cap layers in CMOS applications
Methods of forming through silicon via openings
Connections for memory electrode lines
Composite substrate for layered heaters
Liquid processing method
Method for packaging quad flat non-leaded package body, and package body
Forming alternative material fins with reduced defect density by performing an implantation/anneal defect generation process
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
Electromagnetic relay
Electrode and/or capacitor formation
Method and apparatus for identifying logical blocks of text in a document
