METHOD FOR FABRICATING THE SAME OF SEMICONDUCTOR DEVICE OF METAL LAYER,申请号KR20050112884-传众专利搜索

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发明名称	METHOD FOR FABRICATING THE SAME OF SEMICONDUCTOR DEVICE OF METAL LAYER
摘要
申请公布号	KR20070054844(A)	申请公布日期	2007.05.30
申请号	KR20050112884	申请日期	2005.11.24
申请人	HYNIX SEMICONDUCTOR INC.	发明人	NAM, KI WON
分类号	H01L21/82;H01L21/306	主分类号	H01L21/82
代理机构		代理人
主权项
地址

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