发明名称 PATTERN FORMING METHOD
摘要 Aspects of the invention can provide a patterning forming method capable of patterning a thin film by a simple and inexpensive device. The thin film can be provided on a base member including a photothermal conversion material that converts optical energy into thermal energy and light is radiated onto the base member to remove the thin film corresponding to a light-radiated region, such that the thin film is patterned.
申请公布号 KR100707265(B1) 申请公布日期 2007.04.13
申请号 KR20040061366 申请日期 2004.08.04
申请人 发明人
分类号 G03F7/004;H01L21/027;B05D3/12;B05D7/00;B32B3/00;G02F1/1343;G03F7/11;G03F7/36;H01L51/50;H05B33/10;H05B33/14;H05B33/26;H05K3/06;H05K3/10;H05K3/12;H05K3/14 主分类号 G03F7/004
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