发明名称 Chemical Vapor Deposition Apparatus For Flat Panel Display
摘要 A CVD apparatus for a flat panel display is provided to prevent the lagging of a gas distributing plate and to improve the stability of a depositing process by reducing the weight of the gas distributing plate using a plurality of first and second gas passing holes. A CVD apparatus for a flat panel display includes a chamber for a depositing process on the flat panel display and a gas distribution plate. The gas distributing plate(10) is installed in the chamber. A plurality of first gas passing holes(13) are formed at one side of the gas distributing plate. A plurality of second gas passing holes(15) are formed at the other side of the gas distributing plate. The diameter of the first gas passing hole is larger than that of the second gas passing hole. The first gas passing hole is connected through the second gas passing hole.
申请公布号 KR100701512(B1) 申请公布日期 2007.03.29
申请号 KR20060026711 申请日期 2006.03.23
申请人 发明人
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
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