发明名称 HEAT TREATMENT APPARATUS AND METHOD OF PRODUCING SUBSTRATE
摘要 Heat treatment apparatus and a method of manufacturing a substrate are provided, in which drop of particles produced by a rubbing action between a support strip and a support member can be prevented. Heat treatment apparatus 10 has a reactor 40 for treating a substrate, and a support tool 30 for supporting the substrate 54 in the reactor 40. The support tool 30 has a support part 57 to be contacted to the substrate 54, and a support strip 67 for supporting the support part 57. A back of the support part 57 has a convex portion or a concave portion, and the back of the support part 54 is configured to be not contacted to an edge of the support strip 67, and contacted to a top of the support strip 67 at inner than the edge of the support strip 67.
申请公布号 KR20070032801(A) 申请公布日期 2007.03.22
申请号 KR20077002384 申请日期 2005.08.01
申请人 发明人
分类号 H01L21/324 主分类号 H01L21/324
代理机构 代理人
主权项
地址