MOLECULAR RESISTS BASED ON FUNCTIONALIZED POLYCARBOCYCLES

摘要

The present invention refers to new organic molecules, derived from the class of polycarbocycle derivatives, and their application as components of photoresists, and in particular as components of photoresist compositions where no polymer is comprised as one of the photoresists components. In these photoresist formulations the new molecule(s) is/are the main component(s) (i.e. percentage higher than 50 % w/w).