发明名称 System and method for testing pattern sensitive algorithms for semiconductor design
摘要 A system and method for generating test patterns for a pattern sensitive algorithm. The method comprises the steps extracting feature samples from a layout design; grouping feature samples into clusters; selecting at least one area from the layout design that covers a feature sample from each cluster; and saving each pattern layout covered by the at least one area as test patterns.
申请公布号 US2007038970(A1) 申请公布日期 2007.02.15
申请号 US20050202591 申请日期 2005.08.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DEMARIS DAVID L.;DUNHAM TIMOTHY G.;LEIPOLD WILLIAM C.;MAYNARD DANIEL N.;SCAMAN MICHAEL E.;ZHONG SHI
分类号 G06F17/50 主分类号 G06F17/50
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