发明名称 |
System and method for testing pattern sensitive algorithms for semiconductor design |
摘要 |
A system and method for generating test patterns for a pattern sensitive algorithm. The method comprises the steps extracting feature samples from a layout design; grouping feature samples into clusters; selecting at least one area from the layout design that covers a feature sample from each cluster; and saving each pattern layout covered by the at least one area as test patterns.
|
申请公布号 |
US2007038970(A1) |
申请公布日期 |
2007.02.15 |
申请号 |
US20050202591 |
申请日期 |
2005.08.12 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DEMARIS DAVID L.;DUNHAM TIMOTHY G.;LEIPOLD WILLIAM C.;MAYNARD DANIEL N.;SCAMAN MICHAEL E.;ZHONG SHI |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|