发明名称 VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To decrease the thermal loading of a flat substrate whose surface is oriented parallel to the gravitational force of the earth. SOLUTION: The vapor deposition device is directed at the vapor deposition of a substrate which contains heat-sensitive substances, for example OLEDs (organic light-emitting diodes). To keep heat away from these substances, the vapor deposition device includes an evaporator tube with a special nozzle bar. This nozzle bar, which comprises several linearly arranged openings, projects with respect to the evaporator tube in the direction toward the substrate to be coated. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007031828(A) 申请公布日期 2007.02.08
申请号 JP20060134633 申请日期 2006.05.15
申请人 APPLIED MATERIALS GMBH & CO KG 发明人 BENDER MARCUS;HOFFMANN UWE;KLEMM GUENTER;HAAS DIETER;ENGLERT ULRICH
分类号 C23C14/24 主分类号 C23C14/24
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