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发明名称
Verfahren zur Reinigung durch Entfernung von Teilchen von Oberflächen, Reinigungsvorrichtung und lithographischer Projektionsapparat
摘要
申请公布号
DE60310498(D1)
申请公布日期
2007.02.01
申请号
DE20036010498
申请日期
2003.09.10
申请人
ASML NETHERLANDS B.V.
发明人
HEERENS, GERT-JAN
分类号
B08B7/00;G03F1/00;G03F7/20;G03F7/32;H01L21/027
主分类号
B08B7/00
代理机构
代理人
主权项
地址
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