| 摘要 |
An exposure apparatus having first dust removal device for a printed wiring board and second removal device for a pattern writing photo-mask is provided to completely remove dust from the board, the photo-mask and a platten having the board by fabricating the first dust removal device for removing dust from the platten and the printed wiring board, and the second dust removal device for removing dust from the photo-mask. The exposure apparatus principally comprises: a platten(5) having a printed wiring board; a board feeding device(30) to place the board on the platten; a board output device(40) to take the board outside from the platten; and a photo-mask to write pattern to be exposed. The apparatus further has first dust removal device which moves together with the board feeding device and removes dust from the platten and the printed wiring board when the board is withdrawn after feeding the board, and second dust removal device which moves together with the board output device and removes dust from the photo-mask.
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