| 摘要 |
The present invention has as subject a new composition for cosmetic or pharmaceutical use intended for external use to be applied both to undamaged and damaged skin or onto the mucosa to reduce or inhibit irritation, inflammation and cutaneous erythemia induced by events of an exogenous nature (irritations induced by chemical agents, pharmaceuticals, cosmetic ingredients, physical agents-such as, for example, solar radiation, ultraviolet radiation, ionising radiation, X rays, gamma rays, laser light-bacterial agents, viral agents, etc) and to photoprotect the skin from solar radiation and specifically from damage induced by ultraviolet radiation of types A, B and C. More particularly, the present invention refers to the use of dimethyl sulphone in the preparation of a pharmaceutical or cosmetic composition for topical use, to prevent and/or cure the above mentioned cutaneous manifestations.
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