发明名称 Utilization of device types having different threshold voltages
摘要 A technique implements high impedance nodes using high threshold voltage devices that may generate less leakage current and may have a higher gate oxide breakdown voltage than standard devices in a particular manufacturing technology. Under at least one operating condition, for a particular power supply voltage, a circuit may unable to produce a control signal that is sufficient to turn on such a high threshold voltage device. The technique adjusts the control signal voltage to provide a gate-to-source voltage sufficient to turn on the high threshold voltage device. At another power supply voltage, when the circuit is able to produce a control signal sufficient to turn on the high threshold voltage device, the technique does not adjust the control signal.
申请公布号 US2007001743(A1) 申请公布日期 2007.01.04
申请号 US20050172431 申请日期 2005.06.30
申请人 SILICON LABORATORIES INC. 发明人 WEI DERRICK C.;PIETRUSZYNSKI DAVID
分类号 H03K17/687 主分类号 H03K17/687
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