| 发明名称 |
WAFER HOLDER AND SEMICONDUCTOR PRODUCTION APPARATUS MOUNTED WITH THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wafer holder for a semiconductor production apparatus, wherein a film can be uniformly deposited on the whole wafer surface and few particles are generated, and the semiconductor production apparatus mounted with the same. <P>SOLUTION: The wafer holder is made of a ceramic in which a heating element and a high frequency electrode are buried. The diameter of the high frequency electrode buried in the ceramic is larger than that of an upper high frequency electrode opposing to the high frequency electrode. It is preferable that the main component of the ceramic is aluminum nitride and the high frequency electrode is in a film-like shape. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2006312755(A) |
申请公布日期 |
2006.11.16 |
| 申请号 |
JP20050134877 |
申请日期 |
2005.05.06 |
| 申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
NATSUHARA MASUHIRO;NAKADA HIROHIKO |
| 分类号 |
C23C16/458;C04B35/581;H01L21/205;H01L21/3065;H01L21/683 |
主分类号 |
C23C16/458 |
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