发明名称 PHOTOSENSITIVE SOLDER RESIST COMPOSITION AND PHOTOSENSITIVE SOLDER RESIST FILM, AND PERMANENT PATTERN AND METHOD FOR FORMING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive solder resist composition capable of providing a high performance cured film excellent in heat resistance, wet heat resistance, adhesion, mechanical characteristics and electrical properties, and suitable for use in manufacture of a printed wiring board, a high density multilayer plate, a semiconductor package, etc., and to provide a photosensitive solder resist film obtained by disposing a layer of the photosensitive solder resist composition on a support, and providing a cured film having excellent heat resistance, wet heat resistance, adhesion, mechanical characteristics and electrical properties, and to provide a photosensitive solder resist film optimum for a blue-violet laser direct exposure system. <P>SOLUTION: The photosensitive solder resist composition comprises an alkali-soluble photo-crosslinkable resin, an alkali-soluble elastomer, a polymerizable compound, a photopolymerization initiator, a thermal crosslinking agent, an inorganic filler, a colorant and a heat curing accelerator. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006243563(A) 申请公布日期 2006.09.14
申请号 JP20050061619 申请日期 2005.03.04
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASAKI MASAYUKI
分类号 G03F7/004;C08G18/65;C08G59/42;G03F7/027;G03F7/038;G03F7/40;H05K3/00;H05K3/28 主分类号 G03F7/004
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