| 摘要 |
<P>PROBLEM TO BE SOLVED: To secure polishing stability of a temperature change and configurational or structural polishing stability by making a visco-elastic behavior stable without presenting a glass transition point in a work temperature region of a polishing pad. <P>SOLUTION: This polishing pad is formed by single polyurethane foam composed of a main raw material made of polyol and isocyanate and various kinds of auxiliary raw materials. The glass transition point of the polyurethane foam is made to exist in the range <20°C or >50°C. D hardness stipulated to the ASTM 2240 is made the range of 40 to 70. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
