发明名称 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To make a single semiconductor device correspond to a plurality of kinds of power supply voltages. SOLUTION: In order to reduce channel concentration by forming a pocket region 7 of the same conductivity type as that of a channel region 6 formed between a source region 4 and a drain region 5 in a region close to the source region 4, a region between the source region 4 and the drain region 5 is made into an asymmetric concentration profile, where impurity concentration is high on the side of the source region 4 and low on the side of the drain region 5. Consequently, a current generated by impact ionization, when drain bias is applied is reduced to improve hot carrier resistance by suppressing characteristic deterioration due to the hot carriers, and to enable one semiconductor device to correspond to a plurality of kinds of power supply voltages. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006210653(A) 申请公布日期 2006.08.10
申请号 JP20050020875 申请日期 2005.01.28
申请人 FUJITSU LTD 发明人 MOMIYAMA YOICHI
分类号 H01L29/78;H01L21/8234;H01L21/8238;H01L27/088;H01L27/092 主分类号 H01L29/78
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