发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, CIRCUIT BOARD, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS
摘要 A method for manufacturing a semiconductor device with a bump electrode wherein the bump electrode includes a resin material as a core and at least a top surface covered with a conductive film. The method includes placing the resin material on a substrate on which an electrode terminal is formed by an inkjet method, and forming an interconnecting metal that connects the electrode terminal to a top surface of the resin material.
申请公布号 KR20060082417(A) 申请公布日期 2006.07.18
申请号 KR20060003145 申请日期 2006.01.11
申请人 SEIKO EPSON CORPORATION 发明人 TANAKA SHUICHI;KURIBAYASHI MITSURU
分类号 H01L21/60 主分类号 H01L21/60
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