发明名称 MOLD AND ITS MANUFACTURING METHOD, AND METHOD FOR FORMING PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a mold which can accurately form a recessed and protruded pattern having a nanosize, and also excellently transfer to form to the part to be processed; and its manufacturing method. SOLUTION: The method comprises a process in which a master mold 30 having the recessed and protruded pattern is pressed on the surface of a metal part 3a having a surface of an arithmetical mean degree of roughness Ra of 100 nm or smaller to transfer the recessed and protruded pattern 4 to the metal part 3a. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006142772(A) 申请公布日期 2006.06.08
申请号 JP20040339295 申请日期 2004.11.24
申请人 SONY CORP 发明人 HIRONAKA KATSUYUKI;FURUKAWA KEIKO
分类号 B29C33/38;B29C33/42;B29L17/00;G11B7/26 主分类号 B29C33/38
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