发明名称 |
MOLD AND ITS MANUFACTURING METHOD, AND METHOD FOR FORMING PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a mold which can accurately form a recessed and protruded pattern having a nanosize, and also excellently transfer to form to the part to be processed; and its manufacturing method. SOLUTION: The method comprises a process in which a master mold 30 having the recessed and protruded pattern is pressed on the surface of a metal part 3a having a surface of an arithmetical mean degree of roughness Ra of 100 nm or smaller to transfer the recessed and protruded pattern 4 to the metal part 3a. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006142772(A) |
申请公布日期 |
2006.06.08 |
申请号 |
JP20040339295 |
申请日期 |
2004.11.24 |
申请人 |
SONY CORP |
发明人 |
HIRONAKA KATSUYUKI;FURUKAWA KEIKO |
分类号 |
B29C33/38;B29C33/42;B29L17/00;G11B7/26 |
主分类号 |
B29C33/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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