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发明名称
PLASMA PROCESS APPARATUS
摘要
申请公布号
KR100586899(B1)
申请公布日期
2006.05.29
申请号
KR20050055482
申请日期
2005.06.27
申请人
HITACHI, LTD.
发明人
KAZUMI HIDEYUKI;TETSUKA TSUTOMU;NISHIO RYOJI;ARAI MASATSUGU;YOSHIOKA KEN;TSUBONE TSUNEHIKO;DOI AKIRA;EDAMURA MANABU;MAEDA KENJI;KANAI SABURO
分类号
H01L21/3065;H01J37/32
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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