发明名称 Chemical vapor deposition reactor
摘要 A chemical vapor deposition reactor has a rotatable wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber. The chemical vapor deposition reactor can be used in the fabrication of LEDs and the like.
申请公布号 GB0602942(D0) 申请公布日期 2006.03.22
申请号 GB20060002942 申请日期 2004.06.29
申请人 ELITE OPTOELECTRONICS, INC. 发明人
分类号 C23C16/44;C23C16/455;C23C16/458;C30B25/14;C30B29/40 主分类号 C23C16/44
代理机构 代理人
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