发明名称 POSITIONING DEVICE AND EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a positioning device capable of accurately disposing a sample base along the optical axis of a projection optical system without being influenced by surface shapes of reflecting elements arranged on the optical path of a beam from an interferometer. <P>SOLUTION: The positioning device is equipped with a movable section 7 which can move in an XY plane, the sample base 8 which can move to and away from the movable section, and the interferometer 20 which measures the position information of the sample base 8 in a Z-axial direction by using beams 21 and 22. The positioning device disposes the sample base 8 in the Z-axial direction based upon the position information and correction information regarding the surface shapes of reflecting elements 27, 28, 30, and 37. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006073798(A) 申请公布日期 2006.03.16
申请号 JP20040255452 申请日期 2004.09.02
申请人 NIKON CORP 发明人 KAMIYA SABURO;HIDAKA YASUHIRO
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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