发明名称 |
PROCESSING SYSTEM AND METHOD FOR CHEMICALLY TREATING A TERA LAYER |
摘要 |
A processing system and method for chemically treating a TERA layer on a substrate. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate. In one embodiment, the system for processing a TERA layer includes a plasma-enhanced chemical vapor deposition (PECVD) system for depositing the TERA layer on the substrate, an etching system for creating features in the TERA layer, and a processing subsystem for reducing the size of the features in the TERA layer. |
申请公布号 |
WO2006014193(A1) |
申请公布日期 |
2006.02.09 |
申请号 |
WO2005US15925 |
申请日期 |
2005.05.06 |
申请人 |
TOKYO ELECTRON LIMITED;MOSDEN, AELAN;YAMASHITA, ASAO |
发明人 |
MOSDEN, AELAN;YAMASHITA, ASAO |
分类号 |
G03F7/09;H01L21/027;H01L21/033;H01L21/314;H01L21/316 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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