发明名称 PROCESSING SYSTEM AND METHOD FOR CHEMICALLY TREATING A TERA LAYER
摘要 A processing system and method for chemically treating a TERA layer on a substrate. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate. In one embodiment, the system for processing a TERA layer includes a plasma-enhanced chemical vapor deposition (PECVD) system for depositing the TERA layer on the substrate, an etching system for creating features in the TERA layer, and a processing subsystem for reducing the size of the features in the TERA layer.
申请公布号 WO2006014193(A1) 申请公布日期 2006.02.09
申请号 WO2005US15925 申请日期 2005.05.06
申请人 TOKYO ELECTRON LIMITED;MOSDEN, AELAN;YAMASHITA, ASAO 发明人 MOSDEN, AELAN;YAMASHITA, ASAO
分类号 G03F7/09;H01L21/027;H01L21/033;H01L21/314;H01L21/316 主分类号 G03F7/09
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