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发明名称
METHOD FOR FORMING A SOURCE/DRAIN JUNCTION IN A SEMICONDUCTOR SILICIDE MANUFACTURING PROCEDURE
摘要
申请公布号
KR100551337(B1)
申请公布日期
2006.02.09
申请号
KR20030054584
申请日期
2003.08.07
申请人
发明人
分类号
H01L21/24
主分类号
H01L21/24
代理机构
代理人
主权项
地址
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