发明名称 OXIDATION METHOD OF MATERIAL TO BE TREATED, OXIDATION APPARATUS, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide an oxidation method of a material to be treated in which generation of a facet is prevented by rounding a corner of a bottom in addition to a corner of a shoulder of a trench so that the corners are formed into a shape of a curved surface. SOLUTION: In an oxidation method of a material to be treated; in which a material to be treated W, on the surface of which trenches 4 are formed, is stored in a treatment chamber 22 that is allowed to be evacuated, then an oxidizing gas and a reducing gas are supplied into the treatment chamber, and then a surface of the material to be treated is oxidized in an atmosphere having oxygen activated species and hydroxyl activated species generated by reacting both of the gases; temperature within the treatment chamber is set to be 900°C or lower during the oxidation. Thus, a corner of a bottom is rounded in addition to a corner of a shoulder of a trench, thereby generation of a facet is prevented. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041482(A) 申请公布日期 2006.02.09
申请号 JP20050141402 申请日期 2005.05.13
申请人 TOKYO ELECTRON LTD 发明人 SUZUKI KEISUKE;AOKI KIMIYA;UMEZAWA KOUTAI;MATTHES THOMAS;WELLHAUSEN UWE;DYROFF NORBERT
分类号 H01L21/316;H01L21/76 主分类号 H01L21/316
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