发明名称 EUV LIGHT SOURCE
摘要 A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).
申请公布号 WO2005091879(A3) 申请公布日期 2005.12.22
申请号 WO2005US05935 申请日期 2005.02.24
申请人 CYMER, INC.;PARTLO, WILLIAM, N.;BOWERING, NORBERT, R.;ERSHOV, ALEXANDER, I.;FOMENKOV, IGOR, V.;OLIVER, I., ROGER;VIATELLA, JOHN;JACQUES, ROBERT, N. 发明人 PARTLO, WILLIAM, N.;BOWERING, NORBERT, R.;ERSHOV, ALEXANDER, I.;FOMENKOV, IGOR, V.;OLIVER, I., ROGER;VIATELLA, JOHN;JACQUES, ROBERT, N.
分类号 G03F7/20;G21K1/06;H01J35/20;H05G2/00 主分类号 G03F7/20
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