发明名称 |
Method and apparatus for process control in time division multiplexed (TDM) etch processes |
摘要 |
The present invention provides a method for controlling pressure in a chamber during a time division multiplexed process. A throttle valve is positioned based on an open-loop pressure control algorithm within at least one step of the time division multiplexed etch process. A pressure response of the step is evaluated and compared to a desired pressure response. The throttle valve is then positioned through a proportional, integral and derivative controller step to step of the time division multiplexed etch process based on the evaluation to the desired pressure response.
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申请公布号 |
US2005263485(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
US20050155904 |
申请日期 |
2005.06.20 |
申请人 |
JOHNSON DAVID;WESTERMAN RUSSELL;TEIXEIRA MIKE;LAI SHOULIANG |
发明人 |
JOHNSON DAVID;WESTERMAN RUSSELL;TEIXEIRA MIKE;LAI SHOULIANG |
分类号 |
G05D16/20;H01J37/32;H01L21/00;H01L21/3065;(IPC1-7):H01L21/302;G01R31/00 |
主分类号 |
G05D16/20 |
代理机构 |
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代理人 |
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主权项 |
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