发明名称 |
METHOD OF MANUFACTURING MICROSTRUCTURE, MICROSTRUCTURE, WAVE LENGTH VARIABLE LIGHT FILTER AND MICROMIRROR |
摘要 |
PROBLEM TO BE SOLVED: To provide a microstructure manufacturing method capable of manufacturing a microstructure without damaging in a manufacturing process; the microstructure; a wave length variable light filter; and a micromirror. SOLUTION: A movable body 21a is formed by forming a predetermined opening pattern 24 on a movable part substrate 21 by dry etching, after eliminating a pressure difference between the glass substrate 11 side of the movable part substrate 21 and its opposite side by forming a pressure releasing opening part 25 on the movable part substrate 21 joined to a glass substrate 11, to thereby prevent damage to the microstructure in the manufacturing process caused by the pressure difference. COPYRIGHT: (C)2006,JPO&NCIPI
|
申请公布号 |
JP2005305614(A) |
申请公布日期 |
2005.11.04 |
申请号 |
JP20040128280 |
申请日期 |
2004.04.23 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAKAMURA RYOSUKE;KAMISUKE SHINICHI;MURATA AKIHIRO;YODA MITSUHIRO |
分类号 |
G02B26/00;B81B3/00;B81C1/00;G02B26/08;(IPC1-7):B81C1/00 |
主分类号 |
G02B26/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|