发明名称 METHOD OF MANUFACTURING MICROSTRUCTURE, MICROSTRUCTURE, WAVE LENGTH VARIABLE LIGHT FILTER AND MICROMIRROR
摘要 PROBLEM TO BE SOLVED: To provide a microstructure manufacturing method capable of manufacturing a microstructure without damaging in a manufacturing process; the microstructure; a wave length variable light filter; and a micromirror. SOLUTION: A movable body 21a is formed by forming a predetermined opening pattern 24 on a movable part substrate 21 by dry etching, after eliminating a pressure difference between the glass substrate 11 side of the movable part substrate 21 and its opposite side by forming a pressure releasing opening part 25 on the movable part substrate 21 joined to a glass substrate 11, to thereby prevent damage to the microstructure in the manufacturing process caused by the pressure difference. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005305614(A) 申请公布日期 2005.11.04
申请号 JP20040128280 申请日期 2004.04.23
申请人 SEIKO EPSON CORP 发明人 NAKAMURA RYOSUKE;KAMISUKE SHINICHI;MURATA AKIHIRO;YODA MITSUHIRO
分类号 G02B26/00;B81B3/00;B81C1/00;G02B26/08;(IPC1-7):B81C1/00 主分类号 G02B26/00
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