| 发明名称 |
Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 摘要 |
The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R<SUP>2 </SUP>to R<SUP>4 </SUP>are independently H; C<SUB>1</SUB>-C<SUB>10 </SUB>alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C<SUB>6</SUB>-C<SUB>20 </SUB>aryl. These polymers can be used in making photoresist compositions and coated substrates.
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| 申请公布号 |
US2005239984(A1) |
申请公布日期 |
2005.10.27 |
| 申请号 |
US20050523492 |
申请日期 |
2005.02.03 |
| 申请人 |
FEIRING ANDREW E;SCHADT FRANK L III;PETROV VIACHESLAV A;SMART BRUCE E;FARNHAM WILLIAM B |
发明人 |
FEIRING ANDREW E.;SCHADT FRANK L.III;PETROV VIACHESLAV A.;SMART BRUCE E.;FARNHAM WILLIAM B. |
| 分类号 |
C08F8/00;C08F12/20;C08F214/18;C08F214/26;C08F232/00;C08F232/08;G03F7/00;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):C08F12/20 |
主分类号 |
C08F8/00 |
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