| 发明名称 |
Barrier film integrity on porous low k dielectrics by application of a hydrocarbon plasma treatment |
| 摘要 |
A method for treating a dielectric material using hydrocarbon plasma is described, which allows for thinner films of barrier material to be used to form a robust barrier.
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| 申请公布号 |
US6951810(B2) |
申请公布日期 |
2005.10.04 |
| 申请号 |
US20040804977 |
申请日期 |
2004.03.18 |
| 申请人 |
INTEL CORPORATION |
发明人 |
ABELL THOMAS JOSEPH |
| 分类号 |
H01L21/768;(IPC1-7):H01L21/476 |
主分类号 |
H01L21/768 |
| 代理机构 |
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