METHOD OF MANUFACTURING OXIDE FILM FOR SEMICONDUCTOR DEVICE,申请号KR20040011754-传众专利搜索

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发明名称	METHOD OF MANUFACTURING OXIDE FILM FOR SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20050083281(A)	申请公布日期	2005.08.26
申请号	KR20040011754	申请日期	2004.02.23
申请人	HYNIX SEMICONDUCTOR INC.	发明人	SHIN, SEUNG WOO
分类号	H01L21/316;H01L21/00;H01L21/28;H01L21/283;H01L21/31;H01L21/314;H01L21/469;H01L21/8247;H01L21/84;H01L27/115;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L21/316	主分类号	H01L21/316
代理机构		代理人
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