发明名称 Reflective lithography mask inspection tool based on achromatic Fresnel optics
摘要 A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.
申请公布号 US6914723(B2) 申请公布日期 2005.07.05
申请号 US20030427723 申请日期 2003.04.29
申请人 XRADIA, INC. 发明人 YUN WENBING;WANG YUXIN
分类号 G02B3/08;G02B27/44;G03F7/20;(IPC1-7):G02B27/44 主分类号 G02B3/08
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