发明名称 |
Reflective lithography mask inspection tool based on achromatic Fresnel optics |
摘要 |
A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.
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申请公布号 |
US6914723(B2) |
申请公布日期 |
2005.07.05 |
申请号 |
US20030427723 |
申请日期 |
2003.04.29 |
申请人 |
XRADIA, INC. |
发明人 |
YUN WENBING;WANG YUXIN |
分类号 |
G02B3/08;G02B27/44;G03F7/20;(IPC1-7):G02B27/44 |
主分类号 |
G02B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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