发明名称 |
PROJECTION EXPOSURE APPARATUS, STAGE APPARATUS, AND EXPOSURE METHOD |
摘要 |
<p>A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is placed and movable while holding the substrate, a position measuring system (18 and others) for measuring positional information of the substrate table, and a correcting apparatus (19) for correcting positional displacement occurring in at least either the substrate or the substrate table caused by supply of a liquid. The correcting apparatus corrects positional displacement occurring in at least either the substrate or the substrate table caused by supply of a liquid. By the structure above, a substrate is highly accurate exposed using a liquid immersion method.</p> |
申请公布号 |
WO2005057635(A1) |
申请公布日期 |
2005.06.23 |
申请号 |
WO2004JP18604 |
申请日期 |
2004.12.14 |
申请人 |
NIKON CORPORATION;KAYAMA, YASUNAGA;ARAI, DAI |
发明人 |
KAYAMA, YASUNAGA;ARAI, DAI |
分类号 |
G03F7/20;(IPC1-7):H01L21/027;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|