发明名称 Micro-mechanical device having anti-stiction layer and method of manufacturing the device
摘要 The micro-mechanical structure includes an anti-stiction layer formed by plasma enhanced chemical vapor deposition and plasma etching. The anti-stiction layer is selectively formed on only the area of a substrate other than the top of a movable structure and a part of an electrode that is subsequently bonded to a wire.
申请公布号 US6906845(B2) 申请公布日期 2005.06.14
申请号 US20030690537 申请日期 2003.10.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO CHANG-HO;SHIN HYUNG-JAE;KIM WOON-BAE
分类号 B81B3/00;B81C1/00;G02B26/08;(IPC1-7):G02B26/00 主分类号 B81B3/00
代理机构 代理人
主权项
地址