发明名称 |
Micro-mechanical device having anti-stiction layer and method of manufacturing the device |
摘要 |
The micro-mechanical structure includes an anti-stiction layer formed by plasma enhanced chemical vapor deposition and plasma etching. The anti-stiction layer is selectively formed on only the area of a substrate other than the top of a movable structure and a part of an electrode that is subsequently bonded to a wire.
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申请公布号 |
US6906845(B2) |
申请公布日期 |
2005.06.14 |
申请号 |
US20030690537 |
申请日期 |
2003.10.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO CHANG-HO;SHIN HYUNG-JAE;KIM WOON-BAE |
分类号 |
B81B3/00;B81C1/00;G02B26/08;(IPC1-7):G02B26/00 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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