Lithographic apparatus and device manufacturing method
摘要
<p>Liquid is supplied to a space between the final element (PL) of the projection system and the substrate. A flow of gas towards a vacuum chamber (34) prevents the humid air from escaping to other parts of the projection apparatus. This protects intricate parts of the lithographic apparatus from being damaged by the presence of humid air.</p>
申请公布号
EP1528432(A1)
申请公布日期
2005.05.04
申请号
EP20040256584
申请日期
2004.10.26
申请人
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG
发明人
HOOGENDAM, CHRISTIAAN ALEXANDER;LOOPSTRA, ERIK ROELOF;STREEFKERK, BOB;GELLRICH, BERNARD;WURMBRAND, ANDREAS
