| 发明名称 |
Method and apparatus for fast and local anneal of anti-ferromagnetic (AF) exchange-biased magnetic stacks |
| 摘要 |
A method (and structure) of thermally treating a magnetic layer of a wafer, includes annealing, for a predetermined short duration, a magnetic layer of a single wafer.
|
| 申请公布号 |
US2005087519(A1) |
申请公布日期 |
2005.04.28 |
| 申请号 |
US20030690538 |
申请日期 |
2003.10.23 |
| 申请人 |
INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION |
发明人 |
KLOSTERMANN ULRICH K.;RABERG WOLFGANG;TROUILLOUD PHILIP |
| 分类号 |
H01L21/00;(IPC1-7):B23K26/00 |
主分类号 |
H01L21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
