| 发明名称 |
Method of and apparatus for supplying a dynamic protective layer to a mirror |
| 摘要 |
<p>The present invention relates to a method of supplying a dynamic protective layer to at least one mirror (M) to protect the at least one mirror (M) from etching by ions. The method comprises: supplying a gaseous matter to a chamber (10) containing the at least one mirror (M), monitoring reflectivity of the mirror (M). The thickness of the protective layer is controlled by controlling a potential of the surface of the mirror (M), based on the monitored reflectivity of the mirror (M). <IMAGE></p> |
| 申请公布号 |
EP1522895(A1) |
申请公布日期 |
2005.04.13 |
| 申请号 |
EP20040077690 |
申请日期 |
2004.09.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE, VADIM YEVGENYEVICH;BAKKER, LEVINUS PIETER |
| 分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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