发明名称 |
In-situ pellicle monitor |
摘要 |
A mask structure and method of quantitatively measuring pellicle degradation in production photomasks by measuring overlay in test structures on the mask. A structure is located in a high transmission region close to a transition region between a low transmission and a high transmission region of the mask such that pellicle degradation impacts the printing of the object. A second structure is located in low transmission region such that the printing of the second structure overlaps the first and provides a measure of pellicle degradation.
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申请公布号 |
US2005069785(A1) |
申请公布日期 |
2005.03.31 |
申请号 |
US20040904356 |
申请日期 |
2004.11.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HIBBS MICHAEL STRAIGHT |
分类号 |
G03F1/00;G03F1/14;H01L21/027;(IPC1-7):A47G1/12;G03F9/00;B44F1/00;G03C5/00;G03B27/62 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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