发明名称 |
Graded material and method for synthesis thereof and method for processing thereof |
摘要 |
In homogeneous materials, etching characteristics depend on properties inherent in these materials regardless of whether they are isotropic or anisotropic, and there have been limitations in realizing various desired shapes. A subject for the invention is to provide a gradient material which eliminates these limitations. A gradient material is provided in which the rate of etching with a specific chemical substance changes continuously or by steps from the outermost surface to an inner part thereof. This gradient material is made of a main material which contains an additive capable of changing the etching rate of the main material so that the concentration of the additive changes continuously or by steps. Especially when a glass material containing SiO2 as the main component is used as the main material and fluorine is used as the additive, then a gradient material in which the rate of etching with an aqueous solution of hydrofluoric acid changes in the depth direction can be obtained.
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申请公布号 |
US2005064197(A1) |
申请公布日期 |
2005.03.24 |
申请号 |
US20030333206 |
申请日期 |
2003.01.17 |
申请人 |
NISHII JUNJI;KOYAMA TADASHI;YAMAGUCHI JUN |
发明人 |
NISHII JUNJI;KOYAMA TADASHI;YAMAGUCHI JUN |
分类号 |
C03C15/00;C03C17/02;C03C17/245;C23C16/40;C23C16/44;C23C16/56;H01L21/033;H01L21/302;H01L21/3065;H01L21/31;H01L21/311;H01L21/316;(IPC1-7):B32B17/00 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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