| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, having high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolving power, resistance to dry etching and pattern shape and particularly excellent in solubility to resist solvents and reducing line edge roughness of pattern after development. <P>SOLUTION: The acrylic polymer contains at least one recurring unit selected from recurring units represented by formula (1) and formula (2). The radiation-sensitive resin composition contains the acrylic polymer and an acid generator. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
