PHOTOMASK BLANK, PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a photomask blank producing a photomask having sufficiently low line edge roughness of an etching pattern, and to provide a photomask using the blank and a method for manufacturing a photomask blank.

SOLUTION: In the photomask blank having a multilayer film composed of four or more layers having different compositions from one another other on a substrate, the composition on the interface between the above layers is gently inclined.

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