发明名称 |
Method for fabricating an interference display unit |
摘要 |
A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.
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申请公布号 |
US2004209192(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
US20030705824 |
申请日期 |
2003.11.13 |
申请人 |
PRIME VIEW INTERNATIONAL CO., LTD. |
发明人 |
LIN WEN-JIAN;TSAI HSIUNG-KUANG |
分类号 |
G02B26/00;G02F1/21;G03C5/00;G03F7/00;(IPC1-7):G03C5/00 |
主分类号 |
G02B26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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