发明名称 METHOD OF FORMING A FLUX CONCENTRATING LAYER OF A MAGNETIC DEVICE
摘要 A method of forming a magnetic device (10), especially the digit line (28) of a magnetic random access memory (MRAM) device is disclosed. The digit line (28) includes a stack of materials that includes a barrier layer (18), a seed layer (20) and a soft magnetic layer (22) that is electrochemically deposited. Preferably, the barrier layer (18) and the seed layer (20) are formed by physical vapor deposition (PVD) and the soft magnetic layer (22) is formed by electroless plating. In one embodiment, the barrier layer (18) includes tantalum, the seed layer (20) includes ruthenium and the soft magnetic layer (22) includes nickel and iron.
申请公布号 WO2004079742(A2) 申请公布日期 2004.09.16
申请号 WO2004US03096 申请日期 2004.02.04
申请人 FREESCALE SEMICONDUCTOR, INC.;MOLLA, JAYNAL, A.;D'URSON, JOHN, J.;REN, J., JACK 发明人 MOLLA, JAYNAL, A.;D'URSON, JOHN, J.;REN, J., JACK
分类号 G11C;H01L21/00;H01L21/44;H01L21/4763;H01L27/22 主分类号 G11C
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