发明名称 PROCESS FOR MANUFACTURING PLASMA DISPLAY PANEL AND SUBSTRATE HOLDER
摘要 <p>A process for manufacturing a plasma display panel, and its substrate holder, capable of suppressing generation of dust particles having an adverse effect on the quality of a film in a film deposition system when the film is deposited on the substrate of the plasma display panel. The film is deposited while holding the substrate (3) and a dummy substrate (35) by a first substrate holder (31) comprising a frame having a holding means consisting of a means for supporting the substrate (3) and the dummy substrate (35) from below and a means for regulating the position of the substrate (3) in the planar direction, and a second substrate holder (32) for holding the first substrate holder (31).</p>
申请公布号 WO2004075233(A1) 申请公布日期 2004.09.02
申请号 WO2004JP01632 申请日期 2004.02.16
申请人 JP 发明人 TAKASE, MICHIHIKO;SHINOZAKI, ATSUSHI;FURUKAWA, HIROYUKI
分类号 H01J9/02;H01J9/46;(IPC1-7):H01J9/02 主分类号 H01J9/02
代理机构 代理人
主权项
地址