发明名称 |
WAFER HOLDING BODY FOR SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE MOUNTED WITH THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holding body for semiconductor manufacturing device having a wafer mounting surface improved in soaking property, and to provide a semiconductor manufacturing device mounted with the holding body. SOLUTION: A shaft which supports the wafer holding body having the wafer mounting surface is joined to the wafer holding body. When the heat capacity of the shaft is adjusted to≤40% of that of the wafer holding body, the temperature distribution on the wafer holding surface of the wafer holding body can be controlled to≤±1.0%. It is preferable that the wafer holding body is a ceramic heater having at least a resistance heating element. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004241597(A) |
申请公布日期 |
2004.08.26 |
申请号 |
JP20030028958 |
申请日期 |
2003.02.06 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
NATSUHARA MASUHIRO;NAKADA HIROHIKO;HASHIKURA MANABU;HIIRAGIDAIRA HIROSHI |
分类号 |
C23C14/50;C23C16/46;H01L21/02;H01L21/027;H01L21/205;H01L21/3065;(IPC1-7):H01L21/205;H01L21/306 |
主分类号 |
C23C14/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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