发明名称 WAFER HOLDING BODY FOR SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE MOUNTED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a wafer holding body for semiconductor manufacturing device having a wafer mounting surface improved in soaking property, and to provide a semiconductor manufacturing device mounted with the holding body. SOLUTION: A shaft which supports the wafer holding body having the wafer mounting surface is joined to the wafer holding body. When the heat capacity of the shaft is adjusted to≤40% of that of the wafer holding body, the temperature distribution on the wafer holding surface of the wafer holding body can be controlled to≤±1.0%. It is preferable that the wafer holding body is a ceramic heater having at least a resistance heating element. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004241597(A) 申请公布日期 2004.08.26
申请号 JP20030028958 申请日期 2003.02.06
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NATSUHARA MASUHIRO;NAKADA HIROHIKO;HASHIKURA MANABU;HIIRAGIDAIRA HIROSHI
分类号 C23C14/50;C23C16/46;H01L21/02;H01L21/027;H01L21/205;H01L21/3065;(IPC1-7):H01L21/205;H01L21/306 主分类号 C23C14/50
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