Anordnung zur Realisierung einer stark dotierten vergrabenen epitaktischen Schicht,申请号DE19991053333-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Anordnung zur Realisierung einer stark dotierten vergrabenen epitaktischen Schicht
摘要
申请公布号	DE19953333(B4)	申请公布日期	2004.07.15
申请号	DE19991053333	申请日期	1999.11.05
申请人	INFINEON TECHNOLOGIES AG	发明人	NELLE, PETER;SCHAEFER, HERBERT;VIETZKE, DIRK;STECHER, MATTHIAS;BAUMGARTL, JOHANNES;PERI, HERMANN
分类号	H01L21/74;H01L21/761;(IPC1-7):H01L29/06	主分类号	H01L21/74
代理机构		代理人
主权项
地址

您可能感兴趣的专利

CORRUGATED BOARD CUSHIONING MATERIAL

SIDE MEMBER STRUCTURE OF VEHICLE BODY

DAMAGE PREVENTING MECHANISM

PACKAGING MEMBER AND PACKAGING BODY

SELF-TRAVELING TRUCK SYSTEM AND SELF-TRAVELING TRUCK USED FOR THAT

VEHICULAR AIR OUTLET DEVICE

TRAIN SENSING SYSTEM AND TRAIN COME-AND-GO SENSING METHOD

DRIVE DEVICE OF INK JET PRINTING HEAD

PRESTRESSED CONCRETE MEMBER AND ITS MANUFACTURING METHOD

CONSTANT VOLTAGE SOURCE, RECORDING HEAD, AND RECORDING DEVICE

IMAGE PROCESSOR AND ITS METHOD

METHOD FOR MANUFACTURING HOLLOW INORGANIC PANEL

MANUFACTURING METHOD FOR CERAMIC SUBSTRATE

THERMAL HEAD, ITS MANUFACTURING METHOD, AND THERMAL PRINTER

PROCESS FOR PRODUCING GLAZED SUBSTRATE FOR THERMAL HEAD AND THERMAL HEAD