发明名称 METHOD FOR CARRYING THIN SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a carrying method for preventing any crease of a thin substrate occurring at a liquid drain-off roll section of an etching machine or the like. SOLUTION: In this method, substrates are carried by disposing guide rolls 7 and 8 with a space of≥1 mm therebetween in a large number of liquid drain-off rolls disposed between liquid spray tanks of an etching machine or the like. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004169097(A) 申请公布日期 2004.06.17
申请号 JP20020335556 申请日期 2002.11.19
申请人 HITACHI CHEM CO LTD 发明人 NEGISHI MASAMI
分类号 B65G13/00;C25F7/00;H05K3/06;(IPC1-7):C25F7/00 主分类号 B65G13/00
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