| 摘要 |
There is provided a method of forming, on a substrate, a fine resist pattern comprising a step for forming a photosensitive layer by using a photo-sensitive composition comprising at least a compound generating an acid by irradiation of light and a fluorine-containing polymer, in which the fluorine-containing polymer is represented by the formula (1): -(M1)-(M2)-(A1)- wherein the structural unit M1 is a structural unit derived from a fluorine-containing monomer, in which at least one fluorine atom is bonded to any of carbon atoms forming the polymer trunk chain, the structural unit M2 is a structural unit having an aliphatic ring structure in the polymer trunk chain, the structural unit A1 is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2, provided that at least any one of the structural units M1, M2 and A1 has an acid-reactive functional group Y, and contents of the structural units M1, M2 and A1 are from 1 to 99 % by mole, from 1 to 99 % by mole and from 0 to 98 % by mole, respectively, and the polymer satisfies Equation (X): NT/(NC - NO + 4NF<2>) ≤ 2.0, wherein NT is a compositional average number of whole atoms constituting the fluorine-containing polymer, NC is a compositional average number of carbon atoms, No is a compositional average number of oxygen atoms and NF is a compositional average number of fluorine atoms bonded to carbon atoms of the polymer trunk chain and bonded to carbon atoms forming an aliphatic ring structure among fluorine atoms which constitute the fluorine-containing polymer. In the method of forming a fine pattern, the photosensitive composition having high practicality and prepared using a material having high transparency against exposure light having a short wavelength such as F2 laser beam is used as a resist. <IMAGE>
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