METHOD FOR MANUFACTURING TRANSFER MASK SUBSTRATE, TRANSFER MASK SUBSTRATE, AND TRANSFER MASK

摘要

Accuracy of position of a mask pattern is improved by reducing stress change in a thin film layer which occurs during a manufacturing process of a transfer mask. A method for manufacturing a transfer mask is characterized by comprising a further step before formation of a resist layer in which step a stress controlling layer is formed on a thin film layer for offsetting the stress change in the thin film layer which occurs during the manufacturing process of the mask, and by comprising another step wherein the stress controlling layer or the like is etched using a resist pattern as the etching mask.