发明名称 METHOD FOR PROCESSING MASK DATA AND MASK WRITING SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for processing mask data capable of efficiently decreasing the data volume of mask data, and to provide a mask writing apparatus capable of writing a mask by taking in data which are compressed with a function description. <P>SOLUTION: A plurality of forms and arrangements of drawing written on a mask are expressed by a function definition and a function call to process data. The mask writing system comprises a data processing function part for generating pattern data by taking in the data described by those functions, and a writing function part for writing on the mask in accordance with the pattern data. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004079987(A) 申请公布日期 2004.03.11
申请号 JP20030057487 申请日期 2003.03.04
申请人 SONY CORP 发明人 UEKI SHINICHI
分类号 G03F1/68;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/68
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