发明名称 |
METHOD FOR MANUFACTURING ORGANIC INSULATING FILM, SEMICONDUCTOR DEVICE, AND TFT SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an organic insulating film from a high-quality organic insulating material at a relatively low temperature. SOLUTION: A solution of raw materials contains triple bonds of carbons, and in the materials monomers or oligomers are dissolved into a solvent for development into an organic insulating material. The solution is applied to a substrate surface. The monomers or oligomers on the substrate are irradiated with UV rays for the initiation of polymerization, and this results in an insulating film formed of an organic insulating material. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004071777(A) |
申请公布日期 |
2004.03.04 |
申请号 |
JP20020228088 |
申请日期 |
2002.08.06 |
申请人 |
FUJITSU LTD |
发明人 |
MATSUTANI HIROYASU;IKEDA MASANOBU;KIMURA TAKAHIRO |
分类号 |
B05D3/06;G02F1/1362;H01L21/312;H01L21/336;H01L21/768;H01L23/522;H01L23/532;H01L27/12;H01L29/786;(IPC1-7):H01L21/312 |
主分类号 |
B05D3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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