发明名称 METHOD FOR MANUFACTURING ORGANIC INSULATING FILM, SEMICONDUCTOR DEVICE, AND TFT SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an organic insulating film from a high-quality organic insulating material at a relatively low temperature. SOLUTION: A solution of raw materials contains triple bonds of carbons, and in the materials monomers or oligomers are dissolved into a solvent for development into an organic insulating material. The solution is applied to a substrate surface. The monomers or oligomers on the substrate are irradiated with UV rays for the initiation of polymerization, and this results in an insulating film formed of an organic insulating material. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004071777(A) 申请公布日期 2004.03.04
申请号 JP20020228088 申请日期 2002.08.06
申请人 FUJITSU LTD 发明人 MATSUTANI HIROYASU;IKEDA MASANOBU;KIMURA TAKAHIRO
分类号 B05D3/06;G02F1/1362;H01L21/312;H01L21/336;H01L21/768;H01L23/522;H01L23/532;H01L27/12;H01L29/786;(IPC1-7):H01L21/312 主分类号 B05D3/06
代理机构 代理人
主权项
地址